Category Archives: savina MX wiping Cloth

Savina MX was created to readily meet the needs of the times, with excellent functions enough to cope with the ultimate dust-free condition in super clean rooms.

Savina MX超细纤维无尘擦拭布

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Savina MX超细纤维无尘擦拭布

随着高科技领域的复杂性和精确性日益提高，制造过程中的洁净度要求也变得更加严格。在LSI和LCD等高精度产品的生产中，保持无尘环境尤为关键。这时候，SAVINA MX无尘擦拭布便成为实现这一目标的利器。

为什么选择SAVINA MX无尘擦拭布？

SAVINA MX无尘擦拭布经过特殊设计，专门用于超洁净室环境，确保在生产过程中不会产生纤维脱落或微尘残留。其采用精密织造工艺，密度高达25,700平方厘米/克，有效去除微尘，并且不会在擦拭过程中损伤表面。

高效吸附与清洁

这款无尘布不仅能够高效吸附灰尘颗粒，还具有卓越的液体吸收能力，适用于LSI和LCD制造过程中对洁净度要求极高的场合。它的高密度结构可确保擦拭时不会有微粒或残留物影响生产设备的性能。

低离子残留，保护精密设备

SAVINA MX无尘布的设计考虑了离子残留问题，它经过严格的处理以降低擦拭后的离子溶出率，确保不会对精密电子设备和光学仪器造成污染或损害，为高端制造业提供了可靠的支持。

广泛应用

无论是在光学镜片制造、半导体生产线，还是办公室设备维护，SAVINA MX无尘擦拭布都表现出色。其耐用性和低残留特性使其成为确保超洁净环境下进行精密操作的理想选择。

SAVINA MX无尘擦拭布，不仅仅是一块无尘擦拭布，更是高科技生产环境中的洁净保障。选择它，便是为您的产品质量和生产效率保驾护航！

您可以通过中国的代理经销商购买 Savina 洁净室擦拭布，例如 优斯特。他们提供 Savina CK ，MX等高性能产品，适用于半导体、LCD 生产和光学设备等行业的洁净室环境。您可以直接联系他们了解产品的可用性、规格和定价等详细信息。savinaMX.com

Savina MX超细无尘布：高科技时代的清洁先锋

日本进口Kanebo Savina Minimax无尘擦拭布

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日本进口Kanebo Savina Minimax无尘擦拭布

高科技领域正日益精密和复杂。对于LSI和LCD等产品生产过程中所需的严格无尘环境而言，高效擦拭布是必备要素。Savina MX能够轻松满足时代需求，具有出色的功能，足以应对超级无尘室中的极端无尘条件。

无尘室中所使用的擦拭布应当能够清洁所有仪器、器械和外围设备，同时不会造成污染。擦拭布还要能够吸收并清除多余的水分。Savina MX具备此类擦拭布所需的所有属性，是性能最好的擦拭布之一，专为高科技时代而设计。

超级高收缩、高密度整理产品

Savina MX的横截面

Savina MX的横截面

Savina MX的表面

Savina MX的表面

Savina MX在专门的细针距针织机上编制而成，其坯布横向和纵向的收缩率均达到其原始尺寸的40%。它未经任何粘合剂处理，就达到了这样的致密结构。所得擦拭布表面积高达25,700 c㎡/g，从而确保了在不掉毛的情况下清除灰尘。而传统擦拭布的表面积仅为2,420 c㎡/g。

特　色

  • 掉毛量极少。
  • 迅速而积极地吸收并留住水分。
  • 残留离子和其他物质的溶解率较低。
  • 具备高端的擦拭布性能（灰尘清除量最大，同时不会污染无尘室设备）。

用　途

用途

  • 光磁盘、硬盘和软盘的生产过程
  • 液晶偏转板以及其他物品的生产过程
  • 光盘和磁盘的生产过程
  • 录像机的生产过程
  • 隐形眼镜的生产过程
  • 相机装配线
  • 印刷电路板的清洁工艺
  • 相机镜头镀膜前的清洁工艺
  • 药品生产线清洁工艺
  • 电影胶片清洁工艺
  • 半导体和基础电路的生产过程
  • 精密涂层之前工件的清洁过程

 

savina MX wiping Cloth

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High technology fields are growing every day in sophistication and precision. Highly efficient wiping cloths are essential for a strict dust-free environment in the manufacturing of such products as LSIs and LCDs. Savina MX was created to readily meet the needs of the times, with excellent functions enough to cope with the ultimate dust-free condition in super clean rooms.

Wipers for use in clean rooms should clean all instruments, apparatuses and peripheral devices while causing no contamination. They are also required to absorb and remove any undesired moisture. Savina MX, which contains all properties needed for such wipers, is one of the highest-performance wiping cloths designed for the age of high technology.

Super High-Shrinkage, High-Density Finish

Cross section

Cross section of Savina MX

Surface

Surface of Savina MX

After knitting on a special high gauge knitting machine, the greige for Savina MX is shrunken both lengthwise and widthwise to as much as 40% of its original dimension. It is not treated with binders of any kind to achieve such a dense construction. The resultant wiping cloth has as high a surface area as 25,700 c㎡/g, thus ensuring dust removal without releasing any lint. Conventional wiping cloths have a surface area of only 2,420 c㎡/g.

Features

  • Generates only a minuscule amount of lint.
  • Absorbs and retains water quickly and positively.
  • Has lower dissolution of residual ions and other substances.
  • Provides high wiper performance (removes a maximum amount of dust without contaminating the clean room equipment).

Applications

applications

  • Production processes for photomagnetic disks, hard disks and floppy disks
  • Production processes for deflection plates of liquid crystals and other items
  • Compact and magnetic disk production processes
  • Video deck production processes
  • Contact lens production processes
  • Camera assembly lines
  • Printed circuit board cleaning processes
  • Cleaning processes for camera lenses before coating
  • Medicine production line cleaning processes
  • Movie film cleaning process
  • Production processes for semiconductors and integrated circuits
  • Workpiece cleaning process before precision coating